As of today, Intellisense is proud to announce the immediate addition of the 3D gray scale lithography process simulation feature to Intellisuite. This feature allows you to customize and optimize your gray mask in the simulation phase of Intellisuite and to view and analyze the resulting 3D structure before implementing the actual lab work itself, thus saving time and resources. This will also allow designers to be more innovative and bold in their initial ideas and save them for costly mistakes. Finally, this new feature will allow users to consistently create complex grayscale mask files, a previous major barrier in widespread grayscale lithography implementation.
Dr. Holger Klein, director of Chip Design at OE Solutions America Inc., says this about the new simulation feature: ¡°This feature is a critical new addition for our products¡¯ development and optimization and we are very pleased with the capabilities it brings to exploring various processing options. While working with the Intellisense team, they have addressed our requirements seriously and the result of the development is this great new feature.¡±
Dr. Sripadaraja. Manager, Application and Sales at Intellisense, remarks this new addition to Intellisuite as ¡°another milestone which shows Intellisense is and continuously will be committed to serving the industry and updating our tools to the ever-changing demands of a modern world.¡±
With this new addition, we at Intellisense hope to remove the barriers to widespread grayscale lithography implementation and allow companies access to this new exciting lithography technique and the resulting products and market that can come with it.